Characterization of methylammonium tin iodide thin films prepared by sequential physical vapour deposition

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dc.article.end-page10en
dc.article.start-page1en
dc.citation.doi10.1016/J.PHYSB.2024.416496en
dc.contributor.authorMargdaline Musanga Ligavoen
dc.contributor.authorAlex Sembitoen
dc.contributor.authorSizwe Sibiyaen
dc.contributor.authorSandile Thubaneen
dc.contributor.authorRudolph Erasmusen
dc.contributor.authoral eten
dc.date.accessioned2024-10-29T13:45:01Z
dc.date.available2024-10-29T13:45:01Z
dc.facultyFACULTY OF SCIENCEen
dc.identifier.citationWOSen
dc.identifier.issn0921-4526en
dc.identifier.urihttps://hdl.handle.net/10539/42093
dc.journal.titleCharacterization of methylammonium tin iodide thin films prepared by sequential physical vapour depositionen
dc.journal.volume695en
dc.titleCharacterization of methylammonium tin iodide thin films prepared by sequential physical vapour depositionen
dc.typeJournal Articleen
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